This standard was last reviewed and confirmed in 2021.
Therefore this version remains current.
Abstract
PreviewISO 12406:2010 specifies a secondary-ion mass spectrometric method using magnetic-sector or quadrupole mass spectrometers for depth profiling of arsenic in silicon, and using stylus profilometry or optical interferometry for depth calibration. This method is applicable to single-crystal, poly-crystal or amorphous silicon specimens with arsenic atomic concentrations between 1 x 1016 atoms/cm3 and 2,5 x 1021 atoms/cm3, and to crater depths of 50 nm or deeper.
-
Status: PublishedPublication date: 2010-11
-
Edition: 1Number of pages: 13
-
- ICS :
- 71.040.40 Chemical analysis
Buy this standard
en
| Format | Language | |
|---|---|---|
| std 1 92 | ||
| std 2 92 | Paper |
- CHF92
Life cycle
Got a question?
Check out our FAQs
Customer care
+41 22 749 08 88
Opening hours:
Monday to Friday - 09:00-12:00, 14:00-17:00 (UTC+1)