Reference number
ISO 12406:2010
International Standard
ISO 12406:2010
Surface chemical analysis — Secondary-ion mass spectrometry — Method for depth profiling of arsenic in silicon
Edition 1
2010-11
Read sample
ISO 12406:2010
51418
Published (Edition 1, 2010)
This publication was last reviewed and confirmed in 2021. Therefore this version remains current.

ISO 12406:2010

ISO 12406:2010
51418
Language
Format
CHF 96
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Abstract

ISO 12406:2010 specifies a secondary-ion mass spectrometric method using magnetic-sector or quadrupole mass spectrometers for depth profiling of arsenic in silicon, and using stylus profilometry or optical interferometry for depth calibration. This method is applicable to single-crystal, poly-crystal or amorphous silicon specimens with arsenic atomic concentrations between 1 x 1016 atoms/cm3 and 2,5 x 1021 atoms/cm3, and to crater depths of 50 nm or deeper.

General information

  •  : Published
     : 2010-11
    : International Standard confirmed [90.93]
  •  : 1
     : 13
  • ISO/TC 201/SC 6
    71.040.40 
  • RSS updates

Life cycle

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