International Standard
ISO 23170:2022
Surface chemical analysis — Depth profiling — Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering
Reference number
ISO 23170:2022
Edition 1
2022-06
© ISO 2024
International Standard
Read sample
Published (Edition 1, 2022)

ISO 23170:2022

Format
Language
CHF 151
Convert Swiss francs (CHF) to your currency

Abstract

This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).

General information

  • Status
     : Published
    Publication date
     : 2022-06
    Stage
    : International Standard published [60.60]
  • Edition
     : 1
    Number of pages
     : 29
  • Technical Committee :
    ISO/TC 201/SC 4
    ICS :
    71.040.40 
  • RSS updates

Life cycle

Sustainable Development Goals

This standard contributes to the following Sustainable Development Goals

9
Industry, Innovation and Infrastructure
7
Affordable and Clean Energy

Got a question?

Check out our FAQs

Customer care
+41 22 749 08 88

Opening hours:
Monday to Friday - 09:00-12:00, 14:00-17:00 (UTC+1)

  2. Store
  3. Standards catalogue
  4. ICS
  5. 71
  6. 71.040
  7. 71.040.40
  8. ISO 23170:2022